onsemi FDV303N

These N-Channel enhancement mode field effect transistors are produced using Fairchild's proprietary, high cell density, DMOS technology. This very high density process is tailored to minimize on-state resistance at low gate drive conditions. This device is designed especially for application in battery circuits using either one lithium or three cadmium or NMH cells. It can be used as an inverter or for high-efficiency miniature discrete DC/DC conversion in compact portable electronic devices like cellular phones and pagers. This device has excellent on-state resistance even at gate drive voltages as low as 2.5 volts.

• These N-Channel enhancement mode field effect transistors are produced using proprietary, high cell density, DMOS technology.
• This very high density process is tailored to minimize on-state resistance at low gate drive conditions.
• 25 V, 0.68 A continuous, 2 A Peak.
• RDS(ON)=0.45 Ω @ VGS=4.5 V
• RDS(ON)=0.6 Ω @ VGS=2.7 V
• Very low level gate drive requirements allowing direct operation in 3V circuits. VGS(th)<1 V.
• Gate - Source Zener for ESD ruggedness. >6kV Human Body Model
• Compact industry standard SOT - 23 surface mount package.
• Alternative to TN0200T and TN0201T.

• Battery circuits using either one lithium or three cadmium or NMH cells.
• Compact portable electronic devices like cellular phones and pagers.